Description
Compact, Barrel Type, Low Temperature Ashing Device
Features of Plasma Reactor (Barrel Chamber) (PR200)
- Wide range of application such as ashing, etching, dry cleaning, etc.
- RF Power: 200W
- Feature
- Space-saving due to the compact design
- Feature
- Adjustable RF power for various application
- Feature
- Flexible setting range of output to cope with a variety of testings